NDA@SZTAKI

Targeted removal of copper foil surface impurities for improved synthesis of CVD graphene

Murdock, Adrian T.

van Engers, Christian D.

Britton, Jude

Babenko, Vitaliy

Meysami, Seyyed Shayan

Bishop, Hugh

Crossley, Alison

KoĂłs, Antal Adolf

Grobert, Nicole

Elsevier

2017

QC06 Physics of condensed matter / szilárdtestfizika

Commercially available Cu foils are leading candidates as substrates employed for the generation of large-area graphene using chemical vapour deposition (CVD) techniques. However, the growth of highquality graphene on Cu foils is often hindered by contamination particles, which will also be detrimental for many potential applications of graphene. Here we investigate the influence of typical substrate impurities on the formation of CVD graphene using as-received Cu foils of various purities from different
suppliers and the same cleaned by popular methods. Analytical characterisation of the Cu foils revealed
that contamination particles consist of calcium, aluminium, and silicon oxides. We show that contamination particles are present on foils with purities ranging between 99.8% and 99.9999% and that these particles influence the nucleation density, growth rate, and growth features of graphene domains. Based on our findings we propose new industrially applicable targeted cleaning procedures of immersion in
purposely-selected HCl and KOH solutions to chemically dissolve the aforementioned impurities, bringing about improved growth of graphene.

magyar

Article

PeerReviewed

info:eu-repo/semantics/article

text

http://real.mtak.hu/64042/1/Murdock-gr-CVD-Carbon17.pdf

Murdock, Adrian T. and van Engers, Christian D. and Britton, Jude and Babenko, Vitaliy and Meysami, Seyyed Shayan and Bishop, Hugh and Crossley, Alison and KoĂłs, Antal Adolf and Grobert, Nicole (2017) Targeted removal of copper foil surface impurities for improved synthesis of CVD graphene. Carbon, 122. pp. 207-216. ISSN 0008-6223

http://real.mtak.hu/64042/

https://doi.org/10.1016/j.carbon.2017.06.075