| Tartalom: |
http://real.mtak.hu/6300/ |
| Archívum: |
MTA Könyvtár |
| Gyűjtemény: |
Status = Published
Type = Article
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| Cím: |
The process of formation of amorphous Ni-P Layers made by electroless deposition
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| Létrehozó: |
Szász, András
Kojnok, J.
Kertész, L.
Paál, Zoltán
Hegedűs, Z.
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| Kiadó: |
Elsevier
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| Dátum: |
1984
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| Téma: |
QC Physics / fizika
QC06 Physics of condensed matter / szilárdtestfizika
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| Tartalmi leírás: |
The composition, electronic states and structure of thin Ni-P layers deposited by the electroless method were studied by soft X-ray emission spectroscopy, differential thermal analysis, secondary ion emission, X-ray diffraction and auxiliary microscopic investigations. The first centres of the layer consisted of pure crystalline nickel nuclei. With increasing growth, the deviation from crystallinity increased, with continous changes in the composition. Also, diffusion processes take place transporting aluminium and silicon from the underlying substrate. © 1984.
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| Típus: |
Article
PeerReviewed
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| Formátum: |
text
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| Azonosító: |
Szász, András and Kojnok, J. and Kertész, L. and Paál, Zoltán and Hegedűs, Z. (1984) The process of formation of amorphous Ni-P Layers made by electroless deposition. THIN SOLID FILMS, 116 (1-3). pp. 279-286. ISSN 0040-6090
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